Patents
US patents through Dec 31, 2025 · PatentsView, from the USPTO’s Open Data Portal · read Oct 27, 2026
5,947 patents granted to the 9 names below, as the owner printed on each patent when it was granted. A later sale, a lapse or an expiry is not read, so this is what was granted to ASML Holding N.V.’s names, not what it holds today.
Patents granted
5,947
5,896 utility, 51 reissue, 1976 to Dec 31, 2025
Granted in 2025
268
Against 222 in 2024 and 254 in 2023
Applications published
6,501
301 of them in 2025
Names they are printed under
9
a subsidiary, its own name
By yearGrantedApplications published
'11'12'13'14'15'16'17'18'19'20'21'22'23'24'25
Each pair is one calendar year. Applications are published about eighteen months after filing, so the newest years read low.
What they are aboutgrants since 2021
Optics836
Electrical machinery, apparatus, energy196
Computer technology74
Semiconductors69
Measurement41
Medical technology18
Mechanical elements8
Surface technology, coating5
Engines, pumps, turbines3
Control3
Chemical engineering3
Materials, metallurgy2
The main technology area of each patent, in the World Intellectual Property Organization’s 35 fields.
Under which name9 counted
ASML NETHERLANDS B.V. a subsidiary
NL, as the owner printed on each patent. 2 more under the same name are not counted (printed in US, printed in LR)
4,747 granted
5,029 publishedASML Holding N.V. its own name
NL, as the owner printed on each patent. 2 more under the same name are not counted (printed in US)
641 granted
625 publishedCymer, LLC a subsidiary
US, as the owner printed on each patent
533 granted
191 publishedASML NETHERLANDS B.V. a subsidiary
named as the applicant on its applications, in NL. 4 more under the same name are not counted (printed in US, printed in NZ)
0 granted
486 publishedCymer, LLC a subsidiary
named as the applicant on its applications, in US
0 granted
131 publishedASML US, LLC a subsidiary
US, as the owner printed on each patent. 1 more under the same name are not counted (printed in NL)
23 granted
29 publishedASML Holding N.V. its own name
named as the applicant on its applications, in NL. 2 more under the same name are not counted (printed in US)
0 granted
10 publishedCymer Korea Inc. a subsidiary
KR, as the owner printed on each patent
2 granted
0 publishedASML Holding B.V. its own name
NL, as the owner printed on each patent
1 granted
0 published
Names not counted (2)
Hermes Microvision Incorporated B.V.
Most of its patents print TW; this name counts in NL. 160 granted and 77 published under it are not counted.
Hermes Microvision Incorporated B.V.
Most of its patents print TW; this name counts in NL. 0 granted and 65 published under it are not counted.
Newest grantseach row opens the USPTO’s own copy
| Granted | Patent | Title | Field | Owner as printed |
|---|
| Dec 30, 2025 | 12,510,988 | Enhanced architecture for high-performance detection device technical field | Computer technology | ASML NETHERLANDS B.V. |
| Dec 30, 2025 | 12,510,832 | Fabrication process deviation determination method, calibration method, inspection tool, fabrication system and a sample | Optics | ASML NETHERLANDS B.V. |
| Dec 30, 2025 | 12,510,829 | Method and apparatus for design of a metrology target | Optics | ASML NETHERLANDS B.V. |
| Dec 30, 2025 | 12,510,828 | Method for controlling a manufacturing process and associated apparatuses | Optics | ASML NETHERLANDS B.V. |
| Dec 23, 2025 | 12,505,978 | Charged particle assessment tool, inspection method | Electrical machinery, apparatus, energy | ASML NETHERLANDS B.V. |
| Dec 23, 2025 | 12,505,974 | Systems and methods for focusing charged-particle beams | Electrical machinery, apparatus, energy | ASML NETHERLANDS B.V. |
| Dec 23, 2025 | 12,505,524 | Method for training or using a process model for determining a pattern in a patterning process | Computer technology | ASML NETHERLANDS B.V. |
| Dec 16, 2025 | 12,500,063 | Method and apparatus for inspection | Electrical machinery, apparatus, energy | ASML NETHERLANDS B.V. |
| Dec 9, 2025 | 12,494,342 | Systems and methods for charged particle flooding to enhance voltage contrast defect signal | Electrical machinery, apparatus, energy | ASML NETHERLANDS B.V. |
| Dec 9, 2025 | 12,494,341 | Delay time measurement method and system | Electrical machinery, apparatus, energy | ASML NETHERLANDS B.V. |
Newest applications publishedan application is a clue, never a plan
| Published | Application | Title | Field | Owner as printed |
|---|
| Dec 25, 2025 | 2025/0393280 | SYSTEM AND METHOD FOR DETECTING PARTICLES WITH A DETECTOR DURING INSPECTION | Semiconductors | ASML NETHERLANDS B.V. |
| Dec 25, 2025 | 2025/0391628 | CALIBRATION OF DIGITAL ANALOG CONVERTER TO CONTROL DEFLECTORS IN CHARGED PARTICLE BEAM SYSTEM | Electrical machinery, apparatus, energy | ASML NETHERLANDS B.V. |
| Dec 25, 2025 | 2025/0391011 | SYSTEM AND METHOD FOR IMAGE RESOLUTION CHARACTERIZATION | Computer technology | ASML NETHERLANDS B.V. |
| Dec 25, 2025 | 2025/0391010 | SYSTEM AND METHOD FOR GENERATING PREDICTIVE IMAGES FOR WAFER INSPECTION USING MACHINE LEARNING | Computer technology | ASML NETHERLANDS B.V. |
| Dec 25, 2025 | 2025/0390029 | ADJUSTER USING TORSIONALLY STIFF COUPLER AND ACTUATOR SYSTEM USING SAME | Optics | Cymer, LLC |
| Dec 18, 2025 | 2025/0385480 | APPARATUS FOR AND METHOD OF CONDITIONING LIGHT SOURCE AFTER IDLE PERIOD | Optics | Cymer, LLC |
| Dec 18, 2025 | 2025/0385072 | CHARGED PARTICLE APPARATUS | Electrical machinery, apparatus, energy | ASML NETHERLANDS B.V. |
| Dec 18, 2025 | 2025/0385070 | SCANNING ELECTRON MICROSCOPY (SEM) BACK-SCATTERING ELECTRON (BSE) FOCUSED TARGET AND METHOD | Electrical machinery, apparatus, energy | ASML NETHERLANDS B.V. |
| Dec 18, 2025 | 2025/0383649 | CLASSIFYING PRODUCT UNITS | IT methods for management | ASML NETHERLANDS B.V. |
| Dec 18, 2025 | 2025/0383611 | FLUSHING SYSTEM AND METHOD FOR A LITHOGRAPHIC APPARATUS | Optics | ASML NETHERLANDS B.V. |
What it applied for, 2024 to 2025: Optics 399 · Electrical machinery, apparatus, energy 115 · Computer technology 59 · Semiconductors 23 · Measurement 17 · Medical technology 9.
A patent is counted where the owner printed on it when it was granted carries the company’s own name, a former name, the name of a subsidiary its annual report lists, or its own name with a patent-holding phrase (Technology Licensing, Intellectual Property and the like), once the legal form, case and punctuation are set aside, and prints a country that name counts in. PatentsView’s data are published under the Creative Commons Attribution 4.0 licence. Source: PatentsView's granted patents and pre-grant publications, disambiguated, from the USPTO's Open Data Portal, through Dec 31, 2025, read Oct 27, 2026.